1、 Initial application stage
In the 1950s and 1960s, some application type white light interferometers emerged both domestically and internationally. These interferometers mainly rely on manual operation, reading, calculation, and measurement to evaluate a certain parameter, with relatively low efficiency. During this period, white light interferometry technology was mainly applied in fields such as simple surface morphology measurement and thickness measurement.
2、 Development stages of intelligence and automation
With the rapid development of electronic and computer technology, white light interferometers are beginning to move towards intelligence and automation.
In 1980, a white light interference automatic surface three-dimensional morphology measurement system based on phase-shifting technology measurement principle was proposed. During this period, white light interferometry technology began to achieve automated measurement, improving measurement efficiency and accuracy.
In 1990, a white light interferometry measurement system was developed using Mirau interferometry microstructure instead of Linnik interferometry microstructure. This system has stable performance and strong anti-interference ability, further promoting the development of white light interference technology.
3、 Advanced Systems and Application Expansion Stage
At present, the most advanced white light interferometry measurement systems in the world basically adopt the Mirau interferometer microscope structure, such as the NewView7000 series surface profilometer from ZYGO in the United States, the Talysurf CCI series from Taylor Hobson in the United Kingdom, and the ContourGT-I3D from Bruker in Germany. These systems have the characteristics of high vertical resolution (up to 0.01nm), large vertical measurement range, fast scanning speed, and have implemented autofocus function and image stitching technology, increasing the horizontal measurement range.
In terms of application fields, white light interference technology is not only widely used in semiconductor manufacturing, optical component detection, mechanical processing and other fields, but also gradually expanded to emerging fields such as life sciences and materials science. For example, in the semiconductor manufacturing process, white light interferometers can accurately measure the thickness, flatness, and microstructure of thin films on the wafer surface, ensuring the performance and quality of semiconductor devices. In the field of life sciences, white light interferometry technology is also used for cell imaging and measurement of biological tissue structure.
4、 Technological development trends
In the future, white light interferometry technology will continue to develop towards higher accuracy, faster speed, and wider application areas. With the continuous development of nanotechnology and micro nano manufacturing technology, the requirements for measurement accuracy and resolution will become increasingly high. Therefore, white light interference technology needs continuous innovation and improvement to meet the needs of these emerging fields. Meanwhile, with the continuous advancement of computer technology and artificial intelligence technology, white light interferometry technology will also achieve a more intelligent and automated measurement process, improving measurement efficiency and accuracy.
In summary, white light interferometry technology has undergone significant evolution from its initial application to the development of intelligence and automation, and then to the expansion of advanced systems and applications. In the future, this technology will continue to develop and expand into more fields, making greater contributions to technological progress and social development.